1-(4-Butoxy-1-naphthalenyl)tetrahydro-thiophenium perfluorobutanesulfonate CAS#: 209482-18-8; ChemWhat Code: 1499796
Identification
| Product Name | 1-(4-Butoxy-1-naphthalenyl)tetrahydro-thiophenium perfluorobutanesulfonate |
| IUPAC Name | 1-(4-butoxynaphthalen-1-yl)thiolan-1-ium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate |
| Molecular Structure |  |
| CAS Registry Number | 209482-18-8 |
| EINECS Number | No data available |
| MDL Number | No data available |
| Beilstein Registry Number | No data available |
| Synonyms | 1-(4-n-butoxynaphthalen-1-yl)tetrahydrothiophenium nonafluoro-n-butanesulfonate1-(4-butoxynaphthyl)thiolanium perfluorobutylsulfonate |
| Molecular Formula | C22H23F9O4S2 |
| Molecular Weight | 586.5 |
| InChI | InChI=1S/C18H23OS.C4HF9O3S/c1-2-3-12-19-17-10-11-18(20-13-6-7-14-20)16-9-5-4-8-15(16)17;5-1(6,3(9,10)11)2(7,8)4(12,13)17(14,15)16/h4-5,8-11H,2-3,6-7,12-14H2,1H3;(H,14,15,16)/q+1;/p-1 |
| InChI Key | WNDABSCBNOUSTE-UHFFFAOYSA-M |
| Canonical SMILES | CCCCOC1=CC=C(C2=CC=CC=C21)[S+]3CCCC3.C(C(C(F)(F)S(=O)(=O)[O-])(F)F)(C(F)(F)F)(F)F |
| Patent Information | ||
| Patent ID | Title | Publication Date |
| TWI579263 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME | 2017 |
| US8889336 | Radiation-sensitive resin composition and radiation-sensitive acid generating agent | 2014 |
Physical Data
| Appearance | White to off-white powder |
| Solubility | No data available |
| Flash Point | No data available |
| Refractive index | No data available |
| Sensitivity | No data available |
Spectra
| Description (NMR Spectroscopy) | Nucleus (NMR Spectroscopy) | Solvents (NMR Spectroscopy) | Frequency (NMR Spectroscopy), MHz |
| Chemical shifts, Spectrum | 1H | chloroform-d1 | 400 |
| Chemical shifts, Spectrum | 19F | chloroform-d1 | 400 |
| Description (UV/VIS Spectroscopy) | Solvent (UV/VIS Spectroscopy) | Absorption Maxima (UV/VIS), nm | Ext./Abs. Coefficient, l·mol-1cm-1 |
| Absorption maxima | acetonitrile | 193 | 21.54 |
Route of Synthesis (ROS)
| Conditions | Yield |
| In dichloromethane at -5℃; for 6h; Solvent; | 89.8% |
Safety and Hazards
| GHS Hazard Statements | Not Classified |
Other Data
| Transportation | NONH for all modes of transport |
| Under the room temperature and away from light | |
| HS Code | No data available |
| Storage | Under the room temperature and away from light |
| Shelf Life | 1 year |
| Market Price | USD |
| Druglikeness | |
| Lipinski rules component | |
| Molecular Weight | 586.54 |
| logP | 8.752 |
| HBA | 3 |
| HBD | 0 |
| Matching Lipinski Rules | 2 |
| Veber rules component | |
| Polar Surface Area (PSA) | 74.81 |
| Rotatable Bond (RotB) | 9 |
| Matching Veber Rules | 2 |
| Use Pattern |
| This material is primarily used in the microelectronics and semiconductor industry: Photoresists for photolithography – generates a strong acid upon UV exposure, enabling chemical amplification in photoresist formulations. Semiconductor manufacturing – used in advanced lithographic processes for pattern transfer onto silicon wafers. Electronic chemicals – supplied as a specialty electronic-material intermediate for integrated circuit fabrication and related microfabrication processes. Research and development of chemically amplified resist systems and other UV-sensitive coating technologies. Suppliers generally market it for research and industrial electronic-material applications rather than pharmaceutical or consumer uses. |
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Approved Manufacturers | |
| WatsonChem Advanced Chemical Materials | https://www.watsonchem.com/ |
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Other Suppliers | |
| Watson International Limited | Visit Watson Official Website |
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