DIPHENYL IODONIUM-2-CARBOXYLATE CAS#: 109545-72-4; ChemWhat Code: 208892

IdentificationPhysical DataSpectra
Route of Synthesis (ROS)Safety and HazardsOther Data

Identification

Product NameTBPDPS-PFBS
IUPAC Name2-phenyliodoniobenzoate
Molecular StructureStructure of DIPHENYL IODONIUM-2-CARBOXYLATE CAS 109545-72-4
CAS Registry Number 109545-72-4
EINECS NumberNo data available
MDL NumberNo data available
Beilstein Registry NumberNo data available
Synonyms2-(Phenyliodonio)benzoat
2-(Phenyliodonio)benzoate
2-(Phényliodonio)benzoate
Iodonium, (2-carboxyphenyl)phenyl-, inner salt
(2-CARBOXYLATOPHENYL)(PHENYL)IODANIUM
(2-carboxylatophenyl)phenyliodonium
(2-Carboxyphenyl)phenyliodonium Hydroxide Inner Salt
2-phenyliodoniobenzoate
DIPHENYL IODONIUM-2-CARBOXYLATE
Diphenyliodonium-2-carboxylate
Iodonium, (2-carboxyphenyl)phenyl-, hydroxide, inner salt
Iodonium, (o-carboxyphenyl)phenyl-, hydroxide, inner salt
iodonium,(2-carboxyphenyl)phenyl-,hydroxide,innersalt
Methyl 3-amino-5-methylbenzoate
Methyl3-amino-5-methylbenzoate
Molecular FormulaC13H9IO2
Molecular Weight324.117
InChIInChI=1S/C13H9IO2/c15-13(16)11-8-4-5-9-12(11)14-10-6-2-1-3-7-10/h1-9H
InChI KeyLUGVQQXOGHCZNN-UHFFFAOYSA-N
Canonical SMILESO=C([O-])c1ccccc1[I+]c1ccccc1
Patent Information
No data available

Physical Data

AppearanceWhite to off-white powder
SolubilityNo data available
Flash PointNo data available
Refractive indexNo data available
SensitivityNo data available

Spectra

No data available

Route of Synthesis (ROS)

No data available

Safety and Hazards

GHS Hazard StatementsNot Classified

Other Data

TransportationNONH for all modes of transport
Under the room temperature and away from light
HS CodeNo data available
StorageUnder the room temperature and away from light
Shelf Life2 years
Market PriceUSD
Druglikeness
No data available
Use Pattern
used as a photoacid generator (PAG) in chemically amplified photoresist systems for advanced semiconductor lithography.
Upon exposure to UV or deep ultraviolet (DUV) light, it generates strong acids that initiate catalytic deprotection reactions in photoresist materials, enabling high-resolution pattern formation.

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