Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS#: 1228823-28-6; ChemWhat Code: 1491738
Identification
| Product Name | Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) |
| IUPAC Name | 2-(adamantane-1-carbonyloxy)ethanesulfonate;triphenylsulfanium |
| Molecular Structure | ![Structure of Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (11) CAS 1228823-28-6](https://www.chemwhat.com/wp-content/uploads/2026/02/Structure-of-Sulfonium-triphenyl-salt-with-2-sulfoethyl-tricyclo3.3.1.137decane-1-carboxylate-11-CAS-1228823-28-6.png) |
| CAS Registry Number | 1228823-28-6 |
| EINECS Number | No data available |
| MDL Number | No data available |
| Beilstein Registry Number | No data available |
| Synonyms | triphenylsulfonium 2-(adamantane-1-carbonyloxy)ethanesulfonate |
| Molecular Formula | C31H34O5S2 |
| Molecular Weight | 550.7 |
| InChI | InChI=1S/C18H15S.C13H20O5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;14-12(18-1-2-19(15,16)17)13-6-9-3-10(7-13)5-11(4-9)8-13/h1-15H;9-11H,1-8H2,(H,15,16,17)/q+1;/p-1 |
| InChI Key | WYYSEXOKTYXQKL-UHFFFAOYSA-M |
| Canonical SMILES | C1C2CC3CC1CC(C2)(C3)C(=O)OCCS(=O)(=O)[O-].C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3 |
| Patent Information |
| No data available |
Physical Data
| No data available |
Spectra
| No data available |
Route of Synthesis (ROS)
![Route of Synthesis (ROS) of Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1 1) CAS# 1228823-28-6](https://www.chemwhat.com/wp-content/uploads/2026/02/Route-of-Synthesis-ROS-of-Sulfonium-triphenyl-salt-with-2-sulfoethyl-tricyclo3.3.1.137decane-1-carboxylate-1-1-CAS-1228823-28-6.png)
| Conditions | Yield |
| In dichloromethane; water at 20℃; |
Safety and Hazards
| GHS Hazard Statements | Not Classified |
Other Data
| Transportation | NONH for all modes of transport |
| Under the room temperature and away from light | |
| HS Code | No data available |
| Storage | Under the room temperature and away from light |
| Shelf Life | 2 years |
| Market Price | USD |
| Druglikeness | |
| Lipinski rules component | |
| Molecular Weight | 550.74 |
| logP | 8.03 |
| HBA | 5 |
| HBD | 0 |
| Matching Lipinski Rules | 2 |
| Veber rules component | |
| Polar Surface Area (PSA) | 91.88 |
| Rotatable Bond (RotB) | 8 |
| Matching Veber Rules | 2 |
| Use Pattern |
| Core Function: Photoacid Generator (PAG) |
| It absorbs light and undergoes photolytic cleavage |
| Produces a strong acid (difluoromethanesulfonic acid) The generated acid can catalyze chemically amplified reactions or initiate subsequent cationic polymerization. It is a key functional additive in photoresist and cationic photopolymer curing systems. II. Main Application Areas 1.Semiconductor Photoresists (Chemically Amplified Photoresists, CARs) Applicable to: i-line, KrF, and ArF lithography systems High-resolution chemically amplified photoresists Main functions: Acid generation upon exposure Catalyzes deprotection reactions Amplifies exposure effects → improves resolution, sensitivity, and critical dimension / line edge roughness (CD/LER) control Advantages of the adamantyl structure: Provides high thermal stability Reduces acid diffusion → improves resolution and line edge roughness Enhances optical performance and formulation stability of photoresists Cationic Photocuring Systems Used in UV-induced cationic curing of epoxy resins and vinyl ether materials UV irradiation → acid generation → initiates cationic ring-opening polymerization or crosslinking Applications include: UV-curable coatings and inks Electronic encapsulation materials Photo-patternable insulating layers (e.g., PSPI, PI) |
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