tert-Butyl 2-[4-(diphenylsulphonium)phenoxy]acetate, nonaflate salt CAS#: 857285-80-4; ChemWhat Code: 1499775
Identification
| Product Name | Triphenyl sulfonium, salt with 1-(difluorosulfomethyl)-2,2,2-trifluoroethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) |
| IUPAC Name | [4-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethoxy]phenyl]-diphenylsulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate |
| Molecular Structure | ![Structure of tert-Butyl 2-[4-(diphenylsulphonium)phenoxy]acetate, nonaflate salt CAS 857285-80-4](https://www.chemwhat.com/wp-content/uploads/2026/07/Structure-of-tert-Butyl-2-4-diphenylsulphoniumphenoxyacetate-nonaflate-salt-CAS-857285-80-4.jpg) |
| CAS Registry Number | 857285-80-4 |
| EINECS Number | No data available |
| MDL Number | No data available |
| Beilstein Registry Number | No data available |
| Synonyms | (4-(2-(tert-butoxy)-2-oxoethoxy)phenyl)diphenylsulfonium 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate(4-(2-(tert-butoxy)-2-oxoethoxy)phenyl)diphenylsulfonium nonafluoro-n-butane-sulfonate4-tert-butoxycarbonylmethyloxyphenyldiphenylsulfonium nonafluoro-n-butanesulfonatep-t-butoxycarbonylmethoxyphenyldiphenylsulfonium nonafluoro-n-butanesulfonate |
| Molecular Formula | C28H25F9O6S2 |
| Molecular Weight | 692.604 |
| InChI | InChI=1S/C24H25O3S.C4HF9O3S/c1-24(2,3)27-23(25)18-26-19-14-16-22(17-15-19)28(20-10-6-4-7-11-20)21-12-8-5-9-13-21;5-1(6,3(9,10)11)2(7,8)4(12,13)17(14,15)16/h4-17H,18H2,1-3H3;(H,14,15,16)/q+1;/p-1 |
| InChI Key | QGJXWNMBTQGAFT-UHFFFAOYSA-M |
| Canonical SMILES | CC(C)(C)OC(=O)COc1ccc(S+c2ccccc2)cc1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)F |
| Patent Information | ||
| No data available |
Physical Data
| Appearance | White to off-white powder |
| Solubility | No data available |
| Flash Point | No data available |
| Refractive index | No data available |
| Sensitivity | No data available |
Spectra
| No data available |
Route of Synthesis (ROS)
| No data available |
Safety and Hazards
| GHS Hazard Statements | Not Classified |
Other Data
| Transportation | NONH for all modes of transport |
| Under the room temperature and away from light | |
| HS Code | No data available |
| Storage | Under the room temperature and away from light |
| Shelf Life | 2 years |
| Market Price | USD |
| Druglikeness | |
| Lipinski rules component | |
| Molecular Weight | 692.621 |
| logP | 9.669 |
| HBA | 5 |
| HBD | 0 |
| Matching Lipinski Rules | 2 |
| Veber rules component | |
| Polar Surface Area (PSA) | 51.21 |
| Rotatable Bond (RotB) | 12 |
| Matching Veber Rules | 1 |
| Use Pattern |
| Photoacid Generator (PAG) for Semiconductor Lithography |
| The primary application of CAS 857285-80-4 is as a photoacid generator (PAG) in chemically amplified photoresists. The sulfonium cation generates a strong acid upon exposure to UV, DUV, electron-beam, or EUV radiation, enabling high-resolution pattern formation in semiconductor manufacturing. |
| Advanced Photoresist Formulations |
| Used in:KrF (248 nm) photoresists, ArF (193 nm) photoresists,EUV photoresists,High-resolution micro- and nano-patterning materials. The nonaflate counterion provides strong acidity, good thermal stability, and controlled acid diffusion, which are important for advanced lithography processes. |
| Microelectronics and MEMS Fabrication |
| Electronic Materials Research |
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